JPH0229455U - - Google Patents
Info
- Publication number
- JPH0229455U JPH0229455U JP10855788U JP10855788U JPH0229455U JP H0229455 U JPH0229455 U JP H0229455U JP 10855788 U JP10855788 U JP 10855788U JP 10855788 U JP10855788 U JP 10855788U JP H0229455 U JPH0229455 U JP H0229455U
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- target
- magnetic field
- space
- field generating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims 9
- 239000000463 material Substances 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10855788U JPH0229455U (en]) | 1988-08-18 | 1988-08-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10855788U JPH0229455U (en]) | 1988-08-18 | 1988-08-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0229455U true JPH0229455U (en]) | 1990-02-26 |
Family
ID=31344006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10855788U Pending JPH0229455U (en]) | 1988-08-18 | 1988-08-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0229455U (en]) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59116376A (ja) * | 1982-12-22 | 1984-07-05 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
| JPS60182711A (ja) * | 1984-02-29 | 1985-09-18 | Konishiroku Photo Ind Co Ltd | 磁性薄膜の形成方法およびその装置 |
| JPS61183466A (ja) * | 1985-02-12 | 1986-08-16 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
| JPS6274074A (ja) * | 1985-09-27 | 1987-04-04 | Shimadzu Corp | スパツタ用タ−ゲツトアセンブリ |
-
1988
- 1988-08-18 JP JP10855788U patent/JPH0229455U/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59116376A (ja) * | 1982-12-22 | 1984-07-05 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
| JPS60182711A (ja) * | 1984-02-29 | 1985-09-18 | Konishiroku Photo Ind Co Ltd | 磁性薄膜の形成方法およびその装置 |
| JPS61183466A (ja) * | 1985-02-12 | 1986-08-16 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
| JPS6274074A (ja) * | 1985-09-27 | 1987-04-04 | Shimadzu Corp | スパツタ用タ−ゲツトアセンブリ |
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